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WebBest spinning speed 2000 ~ 4000 rpm. EECS 598-002 Nanophotonics and Nanoscale Fabrication by P.C.Ku8 Edge bead removal (EBR) The resist on the edge of the wafer is often removed (EBR) to reduce potential contamination sources and help the vacuum chuck to hold the wafer. WebⅠ. Introduction. After the 1950s, four basic processes (ion implantation, diffusion, epitaxial growth, and lithography) were invented, and the semiconductor IC process was … bind return key pysimplegui

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